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Low-Pressure Radio-Frequency Plasma Reactor for Ion Implantation – PBII300

Laboratory

Biomaterials and Bioengineering Laboratory


Department

Department of Mining, Metallurgical and Materials Engineering


Funding agency(ies)

iBiomat


Manufacturer (model)

Plasmionique


Commissioning

2014


Equipment Description

This low-pressure plasma reactor uses an adjustable gas mixture depending on the desired surface modifications.


It is primarily used in the laboratory to modify the surface of metals through ion implantation.


Technical Specifications

  • Pressure range: 5 mTorr

  • Available gases: Nitrogen, oxygen

  • Treated surface area: Variable

  • Operating voltage: 0–10 kV

  • Operating frequency: 13.6 MHz

  • Mode: Continuous or pulsed


Areas of expertise

  • Surface modification

  • Low-pressure plasma treatment


Conditions of Use

Training on the instrument or use of the instrument by a research professional is required. Available to academic and/or industrial collaborators.


Rental Fees (CAD)


On-Campus

To be discussed with the person in charge.


Off-Campus (Academic)

To be discussed with the person in charge.


Industry

To be discussed with the person in charge.


Reservations

Pascale Chevalier Ph. D.

pascale.chevallier@crchudequebec.ulaval.ca

418-525-4444 poste 52381




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