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Low-Pressure Radio-Frequency Plasma Reactor for Ion Implantation – PBII300
Laboratory
Biomaterials and Bioengineering Laboratory
Department
Department of Mining, Metallurgical and Materials Engineering
Funding agency(ies)
iBiomat
Manufacturer (model)
Plasmionique
Commissioning
2014
Equipment Description
This low-pressure plasma reactor uses an adjustable gas mixture depending on the desired surface modifications.
It is primarily used in the laboratory to modify the surface of metals through ion implantation.
Technical Specifications
Pressure range: 5 mTorr
Available gases: Nitrogen, oxygen
Treated surface area: Variable
Operating voltage: 0–10 kV
Operating frequency: 13.6 MHz
Mode: Continuous or pulsed
Areas of expertise
Surface modification
Low-pressure plasma treatment
Conditions of Use
Training on the instrument or use of the instrument by a research professional is required. Available to academic and/or industrial collaborators.
Rental Fees (CAD)
On-Campus
To be discussed with the person in charge.
Off-Campus (Academic)
To be discussed with the person in charge.
Industry
To be discussed with the person in charge.
Reservations
Pascale Chevalier Ph. D.
pascale.chevallier@crchudequebec.ulaval.ca
418-525-4444 poste 52381
