Laboratory

Biomaterials and Bioengineering Laboratory

Department

Department of Mining, Metallurgical and Materials Engineering

Funding agency(ies)

iBiomat

Manufacturer (model)

Plasmionique

Commissioning

2008

Equipment Description

This inductively coupled plasma (ICP) reactor uses an adjustable gas mixture depending on the desired surface modifications to treat substrates with a volume plasma. It enables the deposition of diamond-like carbon (DLC) coatings. It can also be operated in sputtering mode using a silver target.

It is primarily used in the laboratory to modify the surface of metals and silicon wafers to produce diamond-like carbon (DLC) or silver-doped DLC coatings.

Technical Specifications

• Reactor type: ICP, Plasma-Enhanced Chemical Vapor Deposition (PECVD)

• Pressure range: 1–50 mTorr

• Available gases: Nitrogen, oxygen, methane, hydrogen

• Treated surface area: Variable

• Operating voltage: ±800 V

• Operating frequency: 13.6 MHz

• Mode: Continuous or pulsed

  
  

Areas of expertise

• Surface modification

• Low-pressure plasma treatment

  
  

Conditions of Use

Training on the instrument or use of the instrument by a research professional is required. Available to academic and/or industrial collaborators.

Rental Fees (CAD)

On-Campus

To be discussed with the person in charge.

Off-Campus (Academic)

To be discussed with the person in charge.

Industry

To be discussed with the person in charge.

Reservations

Pascale Chevalier Ph. D.

pascale.chevallier@crchudequebec.ulaval.ca

418-525-4444 poste 52381