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Low-Pressure Microwave Plasma Reactor

Laboratory

Surface Engineering Laboratory, Biomaterials and Bioengineering Laboratory, Biomaterials for Medical Imaging Laboratory


Department

Biomaterials and Bioengineering Laboratory


Funding agency(ies)

CRSNG


Manufacturer (model)

Plasmionique


Commissioning

2002


Equipment Description

This microwave plasma reactor uses an adjustable gas mixture depending on the desired surface modifications.


It is primarily used in the laboratory to aminate the surfaces of metals, polymers, and glass.


Technical Specifications

  • Reactor type: MW-PECVD (Microwave Plasma-Enhanced Chemical Vapor Deposition)

  • Pressure range: 100–500 mTorr

  • Possible gases: Nitrogen, hydrogen

  • Treated surface: Variable

  • Operating voltage: Not specified

  • Operating frequency: 2.45 GHz

  • Mode: Continuous


Areas of expertise

  • Surface modification

  • Low-pressure plasma treatment


Conditions of Use

Training on the instrument or use of the instrument by a research professional is required. Available to academic and/or industrial collaborators.


Rental Fees (CAD)


On-Campus

To be discussed with the person in charge.


Off-Campus (Academic)

To be discussed with the person in charge.


Industry

To be discussed with the person in charge.


Reservations

Pascale Chevalier Ph. D.

pascale.chevallier@crchudequebec.ulaval.ca

418-525-4444 poste 52381




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