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Low-Pressure Microwave Plasma Reactor
Laboratory
Surface Engineering Laboratory, Biomaterials and Bioengineering Laboratory, Biomaterials for Medical Imaging Laboratory
Department
Biomaterials and Bioengineering Laboratory
Funding agency(ies)
CRSNG
Manufacturer (model)
Plasmionique
Commissioning
2002
Equipment Description
This microwave plasma reactor uses an adjustable gas mixture depending on the desired surface modifications.
It is primarily used in the laboratory to aminate the surfaces of metals, polymers, and glass.
Technical Specifications
Reactor type: MW-PECVD (Microwave Plasma-Enhanced Chemical Vapor Deposition)
Pressure range: 100–500 mTorr
Possible gases: Nitrogen, hydrogen
Treated surface: Variable
Operating voltage: Not specified
Operating frequency: 2.45 GHz
Mode: Continuous
Areas of expertise
Surface modification
Low-pressure plasma treatment
Conditions of Use
Training on the instrument or use of the instrument by a research professional is required. Available to academic and/or industrial collaborators.
Rental Fees (CAD)
On-Campus
To be discussed with the person in charge.
Off-Campus (Academic)
To be discussed with the person in charge.
Industry
To be discussed with the person in charge.
Reservations
Pascale Chevalier Ph. D.
pascale.chevallier@crchudequebec.ulaval.ca
418-525-4444 poste 52381
